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Small sputtering equipment - List of Manufacturers, Suppliers, Companies and Products

Small sputtering equipment Product List

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Small sputtering device

Small sputtering device

Achieve space-saving with a compact design! An ideal sputtering device for university and private research labs (researcher pricing).

Since its establishment in 1964, South Korea's A-tech has been providing thin film manufacturing equipment tailored to customer needs. The Desktop Pro is a compact, high-performance sputtering device that can be installed on a desktop and offers economic advantages. It is ideal for material property research, product QC and QA, and semiconductor failure analysis. ■ For details, please download the catalog ■ ● Inquiries: 03-5472-1722 (TEL)

  • Sputtering Equipment

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Small sputtering device

Small sputtering device

The compatible substrate can be processed up to a maximum of φ1 inch! Equipment equipped with a dual gas nozzle.

The "Compact Sputtering Device" is a laboratory high-vacuum thin film deposition system equipped with a 1.3-inch magnetron sputter cathode. It is equipped with an RF power supply with a matching unit for discharge. It features a dual gas nozzle capable of supporting oxidation reaction sputtering. Additionally, it can process substrates up to a maximum diameter of 1 inch. 【Features】 ■ Equipped with a 1.3-inch magnetron sputter cathode ■ Comes with an RF power supply with a matching unit for discharge ■ Features a dual gas nozzle capable of supporting oxidation reaction sputtering ■ Can process substrates up to a maximum diameter of 1 inch *For more details, please refer to the external link page or feel free to contact us.

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Small sputtering device 'SS-DC・RF301'

Small sputtering device 'SS-DC・RF301'

Compact design yet maintains performance! A sputtering device capable of substrate heating at high temperatures.

The "SS-DC・RF301" is a compact sputtering device equipped with one 2" magnetron cathode and a substrate heating mechanism. Thanks to its simple design, it can be installed in about half the space of an office desk. It employs a substrate up-and-down mechanism, allowing for adjustable distance between the target and the substrate. In addition to being able to heat the substrate at high temperatures, it can also operate using only electricity and gas, and allows for reconfiguration between sputter-up and sputter-down. 【Features】 ■ Space-saving with a simple design ■ Adjustable distance between the target and the substrate ■ Capable of high-temperature substrate heating ■ Standard equipped with a chiller *For more details, please refer to the catalog. Feel free to contact us with any inquiries.

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